EMBRYOLLISSE Lait-Crème Concentré Cult product 75ML

KSh5,200.00

Lait-Crème Concentré is a multifonction skincare. An exceptional care which serves as an ideal make-up base for priming the complexion, as a moisturizer or a beauty mask. It can also be used for post-shaving care

Add to Wishlist
Add to Wishlist

Description

A favourite among dermatologists for decades and lauded by beauty professionals and make-up artists of the stars, this all-round product is their secret to beautiful skin. With moisturizing and nutritive properties, thanks to a blend of ingredients from natural origin rich in essential fatty acids and vitamins, it delivers nutrients to the skin, retains moisture and helps protect it from agression. Plumped up, the skin is silky smooth, soft, supple and glowing.
An exceptional care which serves as an ideal make-up base for priming the complexion, as a moisturizer or a beauty mask, this creamy milk leaves a comfortable satin veil even on dry skin. It can also be used for post-shaving care.

The texture

As nourishing as a balm but as light as milk, this well-loved skincare glides over the skin to moisturize and nourish it. Even the most sensitive skin can’t help but be addicted to its silky-soft texture that leaves a non-greasy veil over the skin. The Lait-Creme Concentré acts like a soothing blanket, its creamy formula bring the skin the comfort andsuppleness it needs.

How to use it

To take full advantage of the star ingredients in the Lait-Crème Concentré and all of their benefits, follow our step-by-step advice :

Apply to clean skin as a day and night creamUse as a make-up primer to enhance the complexion and ensure long-lasting make-up coverage.It also gently removes make-up and impurities and the end of the day when used with a cotton pad.Skin showing signs of dehydration and feeling tight? Apply a thick layer to the skin for 15 minutes or more.

Reviews

There are no reviews yet.

Be the first to review “EMBRYOLLISSE Lait-Crème Concentré Cult product 75ML”

Your email address will not be published. Required fields are marked *